MTI CORPORATION, USA


Compact Powder PVD Coater with DC Magnetron Sputtering & Vibration Stage - VTC-16-PW
   

      Product Introduction

      VTC-16--PW is a compact powder PVD coater, which consists of 2" water cold magnetron sputtering head and       vibration stage. The particles will jump on the vibration stage during coating and form a core-shell structure. The       DC magnetron sputter is suitable for coating for metallic materials. RF power source is optional for non-conductive       material or carbon. The coater will be useful for preparing special powder for 3D printing and solid state electrolyte       powders.

      Specifications :

      Input Voltage
  • 220 VAC 50/60Hz
  • 110 V power is available by using a 1000 W transformer (15 A fuse). The transformer is sold separately
      Output Power
  • 1600 VDC
  • 250 W
  • 150 mA max.
  • Built-in over current protection (>150 mA)
      Sputtering Head

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  • 2" flexible magnetron sputtering head with water cooling jacket is included
  • One manually operated shutter for target protection
  • Sputtering head holder is available for holding sputtering head while non-operation
  • The distance between the sputtering head and sample stage is adjustable from 60 - 100 mm
  • One Water Cold Recirculating Water Chiller 16 L/min Flow is included for cooling sputtering head
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      Vibration Stage

                 

  • The vibration stage is built-in the bottom of the vacuum chamber
  • The vibration speed is adjustable from 400 - 2000 RPM (6 - 33 Hz)
  • One 2" container of powder is placed on the vibration stage. It will rotate during the vibration
  • Suggested powder quantity: less than 500 mg max.
  • Suggested particle size: 1 ~ 1000 microns
      Vacuum Chamber
  • Quartz glass tube, 165 mm OD. X 150 mm ID x 250 mm Height

      Control Panel
  • 6" color touch-screen control panel with PLC integration for easy operation
  • One panel for all parameters monitor and control: vacuum, current
      Ultimate Vacuum Pressure
  • Built-in KF25 vacuum port
  • The system requires an Ar gas tank with pressure regulator (not included)
  • 1.0E-2 Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, Mo targets (not sensitive to air)
  • The lowest vacuum may reach less than 4.0E-6 Torr by pumping overnight and baking
      Gas Atmosphere
  • One needle valve installed to allow Ar gas inlet to achieve better plasma coating
  • The system requires an Ar gas tank with the pressure regulator (not included)
      Target
  • One 2" Copper target is included for testing, target size: 2" Dia. x 2.5mm
  • It also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Li, Mg, etc. almost every kind of metallic material
  • Warning: Aluminum, Chromium or Nickel can be coated by this machine, but please view the Recommend Coating Method in the below target link
      Overall Dimension
      
      Net Weight
  • 20 kg
      Application Notes
  • Warning: Sputtering head connects to HIGH voltage. The operator must wear gloves during operation
  • Make sure the target, sputtering head, substrate, and heating stage are clean before coating, need to use
    the sandpaper and alcohol to clean and fresh the Al or Nickel target each time using
  • Note: the powder must dry and disperse well before coating

 

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